Fandom

CeraWiki

Tungsten disilicide

9.402páginas en
el wiki}}
Crear una página
Discusión0 Compartir

¡Interferencia de bloqueo de anuncios detectada!


Wikia es un sitio libre de uso que hace dinero de la publicidad. Contamos con una experiencia modificada para los visitantes que utilizan el bloqueo de anuncios

Wikia no es accesible si se han hecho aún más modificaciones. Si se quita el bloqueador de anuncios personalizado, la página cargará como se esperaba.

Tungsten disilicide[1]
IUPAC name Tungsten disilicide
Identifiers
CAS number 12039-88-2
Properties
Molecular formula WSi2
Molar mass 240.01 g/mol
Appearance blue-gray tetragonal crystals
Density 9.3 g/cm3
Melting point

2160°C

Solubility in water insoluble
Hazards
EU Index not listed
NFPA 704
NFPA 704.svg
0
1
0
 
Flash point Non-flammable
Related compounds
Other anions Tungsten carbide
Tungsten nitride
Other cations Molybdenum disilicide
 Yes check.svgY (what is this?)  (verify)
Except where noted otherwise, data are given for materials in their standard state (at 25 °C, 100 kPa)
Infobox references

Tungsten disilicide, or just tungsten silicide (WSi2) is an inorganic compound, a silicide of tungsten. It is an electrically conductive ceramic material.

ChemistryEditar

Tungsten silicide can react violently with substances such as strong acids, fluorine, oxidizers, and interhalogens.

ApplicationsEditar

It is used in microelectronics as a contact material, with resistivity 60–80 μΩ cm; it forms at 1000 °C. It is often used as a shunt over polysilicon lines to increase their conductivity and increase signal speed. Tungsten silicide layers can be prepared by chemical vapor deposition, eg. using monosilane or dichlorosilane with tungsten hexafluoride as source gases. The deposited film is non-stoichiometric, and requires annealing to convert to more conductive stoichiometric form. Tungsten silicide is a replacement for earlier tungsten films. [2] Tungsten silicide is also used as a barrier layer between silicon and other metals, e.g. tungsten.

Tungsten silicide also finds use in microelectromechanical systems and for oxidation-resistant coatings.

Films of tungsten silicide can be plasma-etched using eg. nitrogen trifluoride gas.

ReferencesEditar

  1. Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, FL: CRC Press, pp. 4–91, ISBN 0849305942 
  2. [1]
Wikipedia-logo.png
Esta página tiene contenido de Wikipedia. El Artículo original es Tungsten disilicide. La lista de autores la puedes ver en Historial. El texto de Wikipedia esta disponible bajo Licencia Creative Commons Atribución/Compartir-Igual 3.0.

Spotlights de otros wikis

Wiki al azar